Semiconductor Etch & Clean - North America
A North American manufacturer of capital equipment used in semiconductor wafer fabrication sought help on cleaning wafers during photoresist and etching. Sabol modeled the clean and etch bath (mixture of HF/NH3/HCl/H2O) chemistries with rigorous simultaneous equilibrium analysis (nine independent aqueous species, including activity coefficients) and provided insight on optimum conditions, including temperature dependence, Pourbaix diagrams, and non-aqueous solvent systems. Sabol also provided insight on the temperature dependence, application of Pourbaix diagrams, and use of non-aqueous solvent systems for wafer cleaning and etching.
Joseph Sabol, PhD
Chemist and Chemical Consultant
Racine, Wisconsin USA