Project Overview

Silicon Purification - North America

A North American manufacturer of semiconductor processing technology (purification of silicon for downstream semiconductor wafers) sought help on the rate at which metal coatings would be corroded when exposed to chlorosilane gas mixtures at 350 degrees Celsius. Sabol provided thermodynamic information on estimation of free energy of reaction ΔG for various systems,  identified a European laboratory to perform physical testing (to confirm corrosion/passivation predictions), and interpreted the test results.

Joseph Sabol, PhD

Chemist and Chemical Consultant

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